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[CHEMICAL VAPOR DEPOSITION]Hello, you are Visitor Number 16860 on this page.

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Journal TitleCHEMICAL VAPOR DEPOSITION

(According to the latest JCR data, this journal is not indexed in the JCR.)
Journal Title AbbreviationsCHEM VAPOR DEPOS
ISSN0948-1907
h-indexN.A.
CiteScoreN.A.
Self-Citation Ratio (2020-2021)N/A
期刊简介Lorem ipsum dolor sit amet, consectetur adipiscing elit. Sed do eiusmod tempor incididunt ut labore et dolore magna aliqua. Ut enim ad minim veniam, quis nostrud exercitation ullamco laboris nisi ut aliquip ex ea commodo consequat. Duis aute irure dolor in reprehenderit in voluptate velit esse cillum dolore eu fugiat nulla pariatur. Excepteur sint occaecat cupidatat non proident, sunt in culpa qui officia deserunt mollit anim id est laborum.
Official Websitehttp://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-3862
Online Manuscript Submission
Open AccessNo
PublisherWILEY-V C H VERLAG GMBH, PO BOX 10 11 61, WEINHEIM, GERMANY, D-69451
Subject AreaEngineering
Country/Area of PublicationGERMANY
Publication FrequencyBimonthly
Year Publication Started0
Annual Article Volume0
Gold OA文章占比
OA期刊相关信息
WOS期刊SCI分区
Indexing (SCI or SCIE)
Link to PubMed Central (PMC)https://www.ncbi.nlm.nih.gov/nlmcatalog?term=0948-1907%5BISSN%5D
Average Duration of Peer Review *Authorized Data from Publisher:
Data from Authors: >12 Week(s), or Invited contributions
Competitiveness *Data from Authors: Easy
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Relevant Journals 【CHEMICAL VAPOR DEPOSITION】CiteScore Trend
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*All review process metrics, such as acceptance rate and review speed, are limited to our user-submitted manuscripts. As such they may not reflect the journals' exact competitiveness or speed.
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Author: Anonymous


Subject Area: Engineering and Materials
Duration of Peer Review: 0.0 month(s)
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Reviewed 2013-06-19 16:20:00
After submitting the manuscript, you can check the status at any time like elsivier. This wilkey system can only wait...
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